Organosilane nanostructure fabrication on semiconductor substrates using particle lithography

Thomas Mullen

University of North Florida

Patterned organosilane monolayers serve as molecular platforms for electronic, optical, and sensing applications. Among the strategies to pattern organosilane monolayers, particle lithography offers a high throughput means to fabricate organosilane nanopatterns across large areas. However, the size, spacing, and features of the organosilane nanopatterns created via particle lithography are closely coupled to the size of the mesospheres. Herein, the utility of particle lithography for generating organosilane nanostructures is enhanced by disintermediating the organosilane nanopattern features and mesosphere size by tailoring sample preparation conditions. Specifically, the influence of solvent on the nanopore formation within organosilane monolayers and the role of surface water in the formation various types of organosilane nanopatterns are investigated. First, under similar deposition conditions smaller nanopores are generated from anhydrous toluene solutions composition, and larger nanopores are formed from bicyclohexyl solutions. Second, substrate drying conditions are correlated to various organosilane nanopatterns (nanopores, pillars, and rings) created. These insights lead to additional levels of hierarchical control over organosilane nanostructure formation on semiconductor substrates and enables a broader range of nanostructures that can be fabricated